JPH0424435B2 - - Google Patents

Info

Publication number
JPH0424435B2
JPH0424435B2 JP61089563A JP8956386A JPH0424435B2 JP H0424435 B2 JPH0424435 B2 JP H0424435B2 JP 61089563 A JP61089563 A JP 61089563A JP 8956386 A JP8956386 A JP 8956386A JP H0424435 B2 JPH0424435 B2 JP H0424435B2
Authority
JP
Japan
Prior art keywords
thin
thin metal
sheet
corrosion
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61089563A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62247085A (ja
Inventor
Norio Yamamoto
Masaru Kawasaki
Takefumi Kandori
Ryoichi Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP61089563A priority Critical patent/JPS62247085A/ja
Priority to US07/035,050 priority patent/US4755257A/en
Priority to KR1019870003341A priority patent/KR910001776B1/ko
Priority to CN198787102767A priority patent/CN87102767A/zh
Publication of JPS62247085A publication Critical patent/JPS62247085A/ja
Publication of JPH0424435B2 publication Critical patent/JPH0424435B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/202—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP61089563A 1986-04-17 1986-04-17 フオトエッチング法による金属薄板の加工方法 Granted JPS62247085A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61089563A JPS62247085A (ja) 1986-04-17 1986-04-17 フオトエッチング法による金属薄板の加工方法
US07/035,050 US4755257A (en) 1986-04-17 1987-04-06 Method of processing thin metal sheets by photoetching
KR1019870003341A KR910001776B1 (ko) 1986-04-17 1987-04-08 포토 엣칭법에 의한 금속박판의 가공방법
CN198787102767A CN87102767A (zh) 1986-04-17 1987-04-10 用光刻法处理薄金属片的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61089563A JPS62247085A (ja) 1986-04-17 1986-04-17 フオトエッチング法による金属薄板の加工方法

Publications (2)

Publication Number Publication Date
JPS62247085A JPS62247085A (ja) 1987-10-28
JPH0424435B2 true JPH0424435B2 (en]) 1992-04-27

Family

ID=13974282

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61089563A Granted JPS62247085A (ja) 1986-04-17 1986-04-17 フオトエッチング法による金属薄板の加工方法

Country Status (4)

Country Link
US (1) US4755257A (en])
JP (1) JPS62247085A (en])
KR (1) KR910001776B1 (en])
CN (1) CN87102767A (en])

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5062149A (en) * 1987-10-23 1991-10-29 General Dynamics Corporation Millimeter wave device and method of making
US5006432A (en) * 1987-10-28 1991-04-09 Kabushiki Kaisha Toshiba Method for manufacturing a shadow mask
US5186787A (en) * 1988-05-03 1993-02-16 Phillips Roger W Pre-imaged high resolution hot stamp transfer foil, article and method
US5336587A (en) * 1988-05-24 1994-08-09 Kabushiki Kaisha Toshiba Method of manufacturing main plates for exposure printing
US5127601A (en) * 1989-01-23 1992-07-07 Lightning Diversion Systems Conformal lightning shield and method of making
US5194698A (en) * 1990-09-11 1993-03-16 Hughes Aircraft Company Apparatus and method using a permanent mandrel for manufacture of electrical circuitry
US5139451A (en) * 1990-12-31 1992-08-18 Zenith Electronics Corporation Processing and protecting a foil shadow mask for a tension mask color cathode ray tube
JP2637864B2 (ja) * 1991-07-02 1997-08-06 大日本印刷株式会社 シャドーマスクの製造方法
US5348825A (en) * 1991-07-02 1994-09-20 Dai Nippon Printing Co., Ltd. Method for manufacturing shadow mask and shadow mask manufactured by said method
US5484074A (en) * 1994-05-03 1996-01-16 Bmc Industries, Inc. Method for manufacturing a shadow mask
US5500279A (en) * 1994-08-26 1996-03-19 Eastman Kodak Company Laminated metal structure and metod of making same
KR0175012B1 (ko) * 1995-09-13 1999-02-18 김광호 초경강판재의 패턴 형성 방법
US20040200801A1 (en) * 2001-11-19 2004-10-14 Lai Laurence M.C. Manufacture having double sided features in a metal-containing web and manufacture and method for forming same in a liquid-based etch process
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US20060130767A1 (en) 2004-12-22 2006-06-22 Applied Materials, Inc. Purged vacuum chuck with proximity pins
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
KR100832025B1 (ko) * 2007-02-12 2008-05-27 최명훈 금속박판의 색상 구현방법 및 이에 의해 제조된 키패드
JP5660159B2 (ja) * 2013-05-13 2015-01-28 大日本印刷株式会社 金属箔シートの製造方法
CN103716998B (zh) * 2013-12-12 2017-01-11 中国电子科技集团公司第四十一研究所 一种金箔裁切方法
CN105568284A (zh) * 2014-10-16 2016-05-11 黄浩祥 无连接点的金属薄板蚀刻方法及利用该方法制成的金属单元组
WO2017142231A1 (ko) * 2016-02-16 2017-08-24 엘지이노텍 주식회사 금속판, 증착용마스크 및 이의 제조방법
KR102363276B1 (ko) * 2017-07-20 2022-02-17 삼성디스플레이 주식회사 증착용 마스크 및 이의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3506507A (en) * 1967-11-22 1970-04-14 Northern Engraving Co Method of making a metal foil pattern by etching
US3960561A (en) * 1975-04-10 1976-06-01 International Business Machines Corporation Method for making electrical lead frame devices
US4155801A (en) * 1977-10-27 1979-05-22 Rohr Industries, Inc. Process for masking sheet metal for chemical milling
JPS57116773A (en) * 1981-01-12 1982-07-20 Fujitsu Ltd Production of metallic mask
JPS57126971A (en) * 1981-01-29 1982-08-06 Susumu Hosaka Method for precisely processing metal wafer
US4341591A (en) * 1981-04-08 1982-07-27 Rca Corporation Method of fabricating a color-selection structure for a CRT
JPS5896877A (ja) * 1981-12-07 1983-06-09 Toshiba Corp 金属板のエツチング方法

Also Published As

Publication number Publication date
KR910001776B1 (ko) 1991-03-23
KR870010218A (ko) 1987-11-30
JPS62247085A (ja) 1987-10-28
CN87102767A (zh) 1987-10-28
US4755257A (en) 1988-07-05

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